FLUID POWER: W. L. Gore & Assoc. has announced an addition to its line of high-performance cartridge filters for semiconductor applications. The new 40 nm-rated filter, intended for use with chemicals in wet processes and distribution systems, provides 40 nm retention while maintaining the flow of next-best-in-class 50-nm filters.GORE® Filters enable semiconductor fabs to realize both improved performance and lower cost of ownership. The drop-in substitution of GORE® Filters can upgrade retention performance and reduce particle counts while maintaining desired flow rate, as well as enable reduced processing times, higher flow rates and faster bath turnovers.
GORE® Filters for Semiconductor Applications were named as a Best of West Finalist at SEMICON West 2009.
GORE® Filters incorporate Gore’s proprietary high-flow ePTFE (expanded polytetrafluoroethylene) filtration media. Gore is the inventor of ePTFE and the world technical leader in engineering PTFE materials. Gore technology has been used for decades in the world’s best-performing filters for semiconductor, electronics, high-purity chemical and pharmaceutical applications.
- Edited by Liz Taurasi
