Diamonex(R) Closed-drift (CD) Source(TM) is designed for manufacturing processes with high flux ions, for example, substrate cleaning, reactive ion-beam etching, and ion-beam assisted deposition of thin films. Used in DLC coating deposition, the CD source features a gridless design and an on-axis hollow cathode electron source that creates a neutral charge beam to eliminate the need for substrate bias.
Morgan Advanced Ceramics, www.morganadvancedceramics.com. Enter 605
METAPOR porous materials are intended for material handling applications such as air-cushion devices, vacuum clamping tables and chucks, and powder fluidization systems. These materials form production molds of rigid plastic packaging, and components for equipment enclosures and automotive interiors. Materials are intended for the medical, electronics, and general machining and manufacturing industries.
Portec North America-NEST Technologies, www.nesttechnologies.com. Enter 606