WaferSense Airborne Particle Sensor

CyberOptics Semiconductor Inc.'s WaferSenseAirborne Particle Sensor (APS) moves through semiconductor process equipment and automation materialhandling systems to monitor airborne particles, reporting information in real-timeto allow engineers to validate wafer contamination. With a wafer-like shapecompatible with existing automation and wireless communication providingreal-time data, the Airborne Particle Sensor speeds tool qualification andrelease to production. APS reduces time locating particle sources.

With real-time views of particle conditions, process engineers canaddress specific trouble spots and be better prepared to pass particlequalifications on the very first attempt. The metrology device can also be usedto establish a baseline and to ensure operations continue on this baseline aspart of preventive maintenance.

The Airborne Particle Sensor uses a fan to pull non-corrosive gas or airthrough a channel as a laser illuminates the air/gas stream while particlesscatter light onto the sensors photodiode. Compatible with front-ends,coater/developer tracks, deposition and etch equipment, the APS has the abilityto detect particles as small as 0.1 um. The automation-friendly semiconductorsensor doesn't require engineers to open chambers or expose ultra-clean processareas to the environment. The sensor can detect particles in real-time withoutopening the tool.

Using the AirborneParticle Sensor's companion software, ParticleView and ParticleReview, fabengineers can collect and display particle data wirelessly to see the effect ofadjustments in real time, speeding equipment qualification and setup. Particledata can be recorded to compare past to present operations as well as one toolto another to conduct machine-to-machine trend analysis of particle conditionsand to establish process control and conduct process improvement.

The AirborneParticle Sensor is available in 200 mm, 300 mm (and 450mm special order)wafer-like form factors.

WaferSense Airborne Particle Sensor