A team of researchers led by Margaret Murnane and Henry Kapteyn at the University of Colorado developed a sharply focused, ultraviolet or extreme-ultraviolet (EUV) light source that can be used to measure and manipulate objects at the nano-scale. Size has been a major hurdle to developing, or even seeing, the tiny components because the objects can be smaller than the waves of light illuminating them. EUV light, which has a wavelength of only tens of nanometers, can pulse in shorter bursts than any other system currently available. To create this short-wavelength light, Kapteyn and associates use a laser at visible wavelengths, and then convert the light to much shorter wavelengths using high harmonic generation (HHG)–combining photons to generate much higher-energy photons with a correspondingly shorter wavelength. Kapteyn expects the light source to be used for developing and testing EUV lithography equipment. For more information, contact: Josh Chamot from the National Science Foundation at jchamot@ nsf.gov or phone, (703) 292-8070.
According to a study by the National Institute of Standards and Technology, one of the factors in the collapse of the original World Trade Center towers on Sept. 11, 2001, was the reduction in the yield strength of the steel reinforcement as a result of the high temperatures of the fire and the loss of thermal insulation.
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Robots are getting more agile and automation systems are becoming more complex. Yet the most impressive development in robotics and automation is increased intelligence. Machines in automation are increasingly able to analyze huge amounts of data. They are often able to see, speak, even imitate patterns of human thinking. Researchers at European Automation
call this deep learning.
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