A team of researchers led by Margaret Murnane and Henry Kapteyn at the University of Colorado developed a sharply focused, ultraviolet or extreme-ultraviolet (EUV) light source that can be used to measure and manipulate objects at the nano-scale. Size has been a major hurdle to developing, or even seeing, the tiny components because the objects can be smaller than the waves of light illuminating them. EUV light, which has a wavelength of only tens of nanometers, can pulse in shorter bursts than any other system currently available. To create this short-wavelength light, Kapteyn and associates use a laser at visible wavelengths, and then convert the light to much shorter wavelengths using high harmonic generation (HHG)–combining photons to generate much higher-energy photons with a correspondingly shorter wavelength. Kapteyn expects the light source to be used for developing and testing EUV lithography equipment. For more information, contact: Josh Chamot from the National Science Foundation at jchamot@ nsf.gov or phone, (703) 292-8070.
Producing high-quality end-production metal parts with additive manufacturing for applications like aerospace and medical requires very tightly controlled processes and materials. New standards and guidelines for machines and processes, materials, and printed parts are underway from bodies such as ASTM International.
Engineers at the University of San Diego’s Jacobs School of Engineering have designed biobatteries on commercial tattoo paper, with an anode and cathode screen-printed on and modified to harvest energy from lactate in a person’s sweat.
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