A team of researchers led by Margaret Murnane and Henry Kapteyn at the University of Colorado developed a sharply focused, ultraviolet or extreme-ultraviolet (EUV) light source that can be used to measure and manipulate objects at the nano-scale. Size has been a major hurdle to developing, or even seeing, the tiny components because the objects can be smaller than the waves of light illuminating them. EUV light, which has a wavelength of only tens of nanometers, can pulse in shorter bursts than any other system currently available. To create this short-wavelength light, Kapteyn and associates use a laser at visible wavelengths, and then convert the light to much shorter wavelengths using high harmonic generation (HHG)–combining photons to generate much higher-energy photons with a correspondingly shorter wavelength. Kapteyn expects the light source to be used for developing and testing EUV lithography equipment. For more information, contact: Josh Chamot from the National Science Foundation at jchamot@ nsf.gov or phone, (703) 292-8070.
In a move that strengthens its 3D design business, Stratasys continued a 15-month buying spree this week by announcing its plan to acquire GrabCAD, a provider of a cloud-based collaboration environment for engineers.
Many diverse markets take advantage of semiconductor IP; so many that no one can recite the entire list without leaving off several. So why do we track all the vertical markets? They all have a unique set of requirements and value attributes differently. One major vertical market segment is automotive.
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