A team of researchers led by Margaret Murnane and Henry Kapteyn at the University of Colorado developed a sharply focused, ultraviolet or extreme-ultraviolet (EUV) light source that can be used to measure and manipulate objects at the nano-scale. Size has been a major hurdle to developing, or even seeing, the tiny components because the objects can be smaller than the waves of light illuminating them. EUV light, which has a wavelength of only tens of nanometers, can pulse in shorter bursts than any other system currently available. To create this short-wavelength light, Kapteyn and associates use a laser at visible wavelengths, and then convert the light to much shorter wavelengths using high harmonic generation (HHG)–combining photons to generate much higher-energy photons with a correspondingly shorter wavelength. Kapteyn expects the light source to be used for developing and testing EUV lithography equipment. For more information, contact: Josh Chamot from the National Science Foundation at jchamot@ nsf.gov or phone, (703) 292-8070.
Using wireless chips and accessories, engineers can now extract data from the unlikeliest of places -- pumps, motors, bridges, conveyors, refineries, cooling towers, parking garages, down-hole drills and just about anything else that can benefit from monitoring.
With strong marketplace demand for qualified engineers across the board that currently outstrips the available supply, there may never be a better time for engineers and project managers to advance their careers and salaries. Whether those moves are successful in the short-term and long-term is likely to depend on how the transition from one job to the next is handled.
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