A team of researchers led by Margaret Murnane and Henry Kapteyn at the University of Colorado developed a sharply focused, ultraviolet or extreme-ultraviolet (EUV) light source that can be used to measure and manipulate objects at the nano-scale. Size has been a major hurdle to developing, or even seeing, the tiny components because the objects can be smaller than the waves of light illuminating them. EUV light, which has a wavelength of only tens of nanometers, can pulse in shorter bursts than any other system currently available. To create this short-wavelength light, Kapteyn and associates use a laser at visible wavelengths, and then convert the light to much shorter wavelengths using high harmonic generation (HHG)–combining photons to generate much higher-energy photons with a correspondingly shorter wavelength. Kapteyn expects the light source to be used for developing and testing EUV lithography equipment. For more information, contact: Josh Chamot from the National Science Foundation at jchamot@ nsf.gov or phone, (703) 292-8070.
In his keynote address at the RAPID 2015 conference last week, Made In Space CTO Jason Dunn gave an update on how far his company and co-development partner NASA have come in their quest to bring 3D printing to the space station -- and beyond.
On Memorial Day, Americans remember the sacrifices the US armed forces have made, and continue to make, in service to the country. All of us should also consider the developments in technological capabilities and equipment over the years that contribute to the success of our military operations.
Focus on Fundamentals consists of 45-minute on-line classes that cover a host of technologies. You learn without leaving the comfort of your desk. All classes are taught by subject-matter experts and all are archived. So if you can't attend live, attend at your convenience.