A team of researchers led by Margaret Murnane and Henry Kapteyn at the University of Colorado developed a sharply focused, ultraviolet or extreme-ultraviolet (EUV) light source that can be used to measure and manipulate objects at the nano-scale. Size has been a major hurdle to developing, or even seeing, the tiny components because the objects can be smaller than the waves of light illuminating them. EUV light, which has a wavelength of only tens of nanometers, can pulse in shorter bursts than any other system currently available. To create this short-wavelength light, Kapteyn and associates use a laser at visible wavelengths, and then convert the light to much shorter wavelengths using high harmonic generation (HHG)–combining photons to generate much higher-energy photons with a correspondingly shorter wavelength. Kapteyn expects the light source to be used for developing and testing EUV lithography equipment. For more information, contact: Josh Chamot from the National Science Foundation at jchamot@ nsf.gov or phone, (703) 292-8070.
Design collaboration now includes the entire value chain. From suppliers to customers, purchasing to outside experts, the collaborative design team includes internal and external groups. The design process now stretches across the globe in multiple software formats.
A new high-pressure injection-molding technology produces near-net shape parts with 2-inch-thick walls from high-performance materials like PEEK, PAI, and carbon-filled polymers. Parts show no voids, sinks, or porosity, have more consistent mechanical properties, and are stronger.
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