The University of Glasgow says that a researcher has found a way of improving the quality of laser chip processing that could result in Internet speeds up to 100 times faster than today’s.
The breakthrough technique reportedly involves the use of a “specially-optimized gas mixture based on chlorine” in the dry etching process. If it’s implemented on a mass production scale, the university says it would enable semiconductor manufacturers to implement higher-speed, lower-cost lasers in their microchips. The lasers would enable integrated circuits to process information at speeds up to 100 times faster than they can now, according to a story on the Herald Scotland web site.
The researcher, Dr. Rafal Dylewicz at the school’s Optoelectronics Research Group, was reportedly able to use the process to create extremely tiny structures on an indium phosphide semiconductor wafer.
“The complete production of optical devices depends upon a number of different processes,” Dylewicz said. “Based upon the developments in the dry etch process, we are one step closer to having a reliable process, hence one step closer to mass producing these important devices.”