As the world awaits commercialization of 0.18 micron- technology wafers, a University of Texas (Austin, TX) team led by Grant Willson printed 0.08 micron features on a semiconductor wafer using a 193-nm-wavelength stepper. The Semiconductor Industry Association's roadmap for the market did not expect 0.08 micron features until the year 2009. Experts predicted the development of a new post-optical technology to produce sizes at or below 0.10 micron. However, Willson generated the minute features using an etched-quartz phase-shift photomask produced by DuPont Photomasks Inc. (Round Rock, TX). "I didn't believe it could be done at first," says Willson. "It really works better than my wildest imaginings, and it appears that the process latitude is there to generate smaller features yet." Call (512) 471-7272.
A new method of modeling how they are created with chemical vapor deposition (CVD) could reduce the cost of carbon nanostructures used for for research and commercial applications, including advanced sensors and batteries.
Researchers have been developing a number of nano- and micro-scale technologies that can be used for implantable medical technology for the treatment of disease, diagnostics, prevention, and other health-related applications.
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