Engineers at Radiance Laboratories, Inc. (South Burlington, VT) are applying a new radiation-based cleaning process to glass substrates used in the manufacturing of flat panel displays. Under a $140,000 Phase I Evaluation Contract from the U.S. Display Consortium (USDC), Radiance Labs will demonstrate the contamination-removal capability of the process on bare glass and glass containing metal and oxide layers, resist, and polimide. The company's patented cleaning method uses high-energy radiation, usually from a laser, and a flowing gas such as nitrogen, to clean high tech and industrial surfaces. Radiance Lab engineers, in conjunction with those at USDC, will jointly look for the optimum process recipe for each substrate sample set. The recipes will be applied to 150 product samples in final cleaning. "Besides flat panel display substrates, we are working with manufacturers on cleaning several other surfaces, including hard disks, optics, photomasks, and silicon wafers," says Donna Bethell, president and CEO of Radiance Services Company. FAX: (301) 654-1034.
The series now can interface with a wider array of EtherNet/IP-compliant hardware across many industrial sectors, including factory automation systems, plastic injection molding apparatus, and materials-handling equipment.
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